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Defects Removed from Monolayer Semiconductor

Category: Science & Technology
Posted: 07:37AM

Thin is in for a variety of electronics when it comes to the devices we hold and the components within them. Actually making these thin components can be very difficult though, because defects have a more pronounced impact on thin materials, with monolayer materials being impacted the most. Researchers at the University of California, Berkeley and Berkeley Lab though have discovered a way to remove defects in molybdenum disulfide (MoS2) and dramatically improve its photoluminescence quantum yield.

Ultra-thin materials, including molecule-thick monolayers are interesting to scientists because they absorb very little light and are very flexible, making them very resilient. To remove the defects from a monolayer of MoS2 the researchers used the superacid bistriflimide or TFSI. The superacid removes contaminants on the monolayer's surface and by protonation adds protons or hydrogen atoms to fill in the defects. This increased the photoluminescence quantum yield, the ratio of light generated and the amount of energy applied, for MoS2 from less than one percent to 100%, making it optoelectronically perfect.

This perfection should make it an excellent material for creating high performance LED displays, which would also be transparent and flexible. Also, because of how thin monolayers of MoS2 are, it can be highly electrically tunable to the point that pixels made from it could emit different colors just by applying different voltages. Potentially this discovery could also be applied to improving the quality of transistors as they reach to ever smaller sizes.

Source: University of California, Berkeley

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