Toshiba Aiming For Sub-25nm Flash Memory Production
Toshiba currently produces NAND flash memory chips using 32nm and 43nm processes, but it recently announced plans to invest $160 million this year building a test production line, part of preparation to produce chips with circuitry less than 25nm in width. Toshiba says it should be able to start producing parts with circuit widths less than 30nm soon and that it plans to get down into the sub-25nm range potentially as soon as 2012.
With a joint venture between Intel and Micron announcing the sampling of 25nm parts earlier in the year, this announcement by Toshiba should mean that there is a greater supply of higher density chips and should also provide some competition to drive down prices. Cheaper high density chips will ultimately mean increased capacities and/or lower prices on flash memory products such as memory cards and SSDs.